1673-159X

CN 51-1686/N

不同Al含量的Ti/Al合金靶对磁控溅射离子镀TiAlN薄膜力学性能的影响

Influence of Different Content of Aluminum in Ti/Al Alloy Targets on Mechanical Properties of TiAlN Films Prepared by Magnetron Sputtering Ion Plating

  • 摘要: 采用不同Al含量的Ti/Al合金靶材在硬质合金刀具上沉积TiAlN薄膜,研究靶材中不同的Al含量对TiAlN薄膜表面粗糙度、硬度以及膜基结合力等性能的影响,通过显微硬度仪、划痕仪、金相显微镜和XRD等仪器分别对薄膜的硬度、结合力、组织结构等主要性能进行测试分析。实验结果表明:随着Ti/Al合金靶中Al含量的增加,TiAlN薄膜的硬度先增加后减小,膜基结合力逐渐增加;当Al在Ti/Al合金靶材中所占的比值为2:3时,TiAlN薄膜的硬度、耐磨性等综合力学性能最佳。

     

    Abstract: TiAlN films were deposited on cemented carbide cutting tools with different aluminum content of Ti/Al alloy material. We studied different aluminum content of the target material influence on membrane performance such as the surface roughness, TiAlN film hardness and adhesion strength. Test and analysis of film hardness, adhesion, organization structure and other main performance were conducted respectively by microhardness tester, scratch tester, metallographic microscope, SEM and EDS equipment. Experimental results show that with the increase of Al content in the Ti/Al alloy target, TiAlN film hardness increases firstly and then decreases, and the film adhesion increases gradually. When Al content in the Ti/Al alloy material for the value is 2/3, TiAlN film is of the best comprehensive mechanical properties such as hardness, wear resistance.

     

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